Dissipative light masks for atomic nanofabrication

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Bibliographische Detailangaben
Weitere Verfasser: Stützle, Ralf (BerichterstatterIn) , Oberthaler, Markus K. (BerichterstatterIn)
Dokumenttyp: Article (Journal)
Sprache:Englisch
Veröffentlicht: 2003
In: Journal of optics. B, Quantum and semiclassical optics
Year: 2003, Jahrgang: 5, Pages: S164-S169
ISSN:1741-3575
DOI:10.1088/1464-4266/5/2/375
Online-Zugang:Resolving-System, Volltext: http://dx.doi.org/10.1088/1464-4266/5/2/375
Volltext
Verfasserangaben:R. Stützle, D. Jürgens, A. Habenicht, and M. K. Oberthaler

MARC

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