The temperature-dependent decomposition of SiO studied by infrared vibrational spectroscopy
The temperature dependence of vibrational bands in SiO films deposited onto Si was studied under ultra high vacuum conditions. In the first series of measurements, films were deposited at various substrate temperatures from 40 K to 573 K and infrared spectra were monitored in situ between 450 cm−1 a...
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| Hauptverfasser: | , , , |
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| Dokumenttyp: | Article (Journal) |
| Sprache: | Englisch |
| Veröffentlicht: |
September 1, 2012
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| In: |
Applied spectroscopy
Year: 2012, Jahrgang: 62, Heft: 9, Pages: 1061-1066 |
| ISSN: | 1943-3530 |
| DOI: | 10.1366/12-06658 |
| Online-Zugang: | Verlag, Volltext: http://dx.doi.org/10.1366/12-06658 Verlag, Volltext: http://journals.sagepub.com/doi/pdf/10.1366/12-06658 
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| Verfasserangaben: | Steffen Wetzel, Markus Klevenz, Annemarie Pucci, Hans-Peter Gail |
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| LEADER | 00000caa a2200000 c 4500 | ||
|---|---|---|---|
| 001 | 1572244232 | ||
| 003 | DE-627 | ||
| 005 | 20220814121620.0 | ||
| 007 | cr uuu---uuuuu | ||
| 008 | 180423s2012 xx |||||o 00| ||eng c | ||
| 024 | 7 | |a 10.1366/12-06658 |2 doi | |
| 035 | |a (DE-627)1572244232 | ||
| 035 | |a (DE-576)502244232 | ||
| 035 | |a (DE-599)BSZ502244232 | ||
| 035 | |a (OCoLC)1341007545 | ||
| 040 | |a DE-627 |b ger |c DE-627 |e rda | ||
| 041 | |a eng | ||
| 084 | |a 29 |2 sdnb | ||
| 100 | 1 | |a Wetzel, Steffen |d 1982- |e VerfasserIn |0 (DE-588)1026158672 |0 (DE-627)726209430 |0 (DE-576)371435668 |4 aut | |
| 245 | 1 | 4 | |a The temperature-dependent decomposition of SiO studied by infrared vibrational spectroscopy |c Steffen Wetzel, Markus Klevenz, Annemarie Pucci, Hans-Peter Gail |
| 264 | 1 | |c September 1, 2012 | |
| 300 | |a 6 | ||
| 336 | |a Text |b txt |2 rdacontent | ||
| 337 | |a Computermedien |b c |2 rdamedia | ||
| 338 | |a Online-Ressource |b cr |2 rdacarrier | ||
| 500 | |a Gesehen am 23.04.2018 | ||
| 520 | |a The temperature dependence of vibrational bands in SiO films deposited onto Si was studied under ultra high vacuum conditions. In the first series of measurements, films were deposited at various substrate temperatures from 40 K to 573 K and infrared spectra were monitored in situ between 450 cm−1 and 5000 cm−1. In a second series of measurements, a film was deposited at 300 K and post-annealed to various temperatures ranging from 373 K to 1173 K. A shift of the strongest vibrational frequency of SiO by several 10 cm−1 to higher wavenumbers with increasing temperature was observed in both kinds of experiments. The observed spectral shifts are considered as an indication of changes in the frequency of occurrence of the various Si-SiyO4-y units (0 ⩽ y ⩽ 4). | ||
| 700 | 1 | |a Klevenz, Markus |e VerfasserIn |0 (DE-588)139762795 |0 (DE-627)613091302 |0 (DE-576)313015813 |4 aut | |
| 700 | 1 | |a Pucci, Annemarie |e VerfasserIn |0 (DE-588)1020648783 |0 (DE-627)691291969 |0 (DE-576)361698739 |4 aut | |
| 700 | 1 | |a Gail, Hans-Peter |d 1941- |e VerfasserIn |0 (DE-588)1018806776 |0 (DE-627)690692080 |0 (DE-576)181935627 |4 aut | |
| 773 | 0 | 8 | |i Enthalten in |t Applied spectroscopy |d London : Sage, 1952 |g 62(2012), 9, Seite 1061-1066 |h Online-Ressource |w (DE-627)269243860 |w (DE-600)1474251-2 |w (DE-576)088704165 |x 1943-3530 |7 nnas |a The temperature-dependent decomposition of SiO studied by infrared vibrational spectroscopy |
| 773 | 1 | 8 | |g volume:62 |g year:2012 |g number:9 |g pages:1061-1066 |g extent:6 |a The temperature-dependent decomposition of SiO studied by infrared vibrational spectroscopy |
| 856 | 4 | 0 | |u http://dx.doi.org/10.1366/12-06658 |x Verlag |x Resolving-System |3 Volltext |
| 856 | 4 | 0 | |u http://journals.sagepub.com/doi/pdf/10.1366/12-06658 |x Verlag |3 Volltext |
| 951 | |a AR | ||
| 992 | |a 20180423 | ||
| 993 | |a Article | ||
| 994 | |a 2012 | ||
| 998 | |g 1018806776 |a Gail, Hans-Peter |m 1018806776:Gail, Hans-Peter |d 700000 |d 714000 |d 714200 |e 700000PG1018806776 |e 714000PG1018806776 |e 714200PG1018806776 |k 0/700000/ |k 1/700000/714000/ |k 2/700000/714000/714200/ |p 4 |y j | ||
| 998 | |g 1020648783 |a Pucci, Annemarie |m 1020648783:Pucci, Annemarie |d 130000 |d 130700 |e 130000PP1020648783 |e 130700PP1020648783 |k 0/130000/ |k 1/130000/130700/ |p 3 | ||
| 998 | |g 139762795 |a Klevenz, Markus |m 139762795:Klevenz, Markus |d 130000 |d 130700 |e 130000PK139762795 |e 130700PK139762795 |k 0/130000/ |k 1/130000/130700/ |p 2 | ||
| 998 | |g 1026158672 |a Wetzel, Steffen |m 1026158672:Wetzel, Steffen |d 130000 |d 130700 |e 130000PW1026158672 |e 130700PW1026158672 |k 0/130000/ |k 1/130000/130700/ |p 1 |x j | ||
| 999 | |a KXP-PPN1572244232 |e 300686560X | ||
| BIB | |a Y | ||
| SER | |a journal | ||
| JSO | |a {"language":["eng"],"recId":"1572244232","type":{"media":"Online-Ressource","bibl":"article-journal"},"note":["Gesehen am 23.04.2018"],"title":[{"title":"The temperature-dependent decomposition of SiO studied by infrared vibrational spectroscopy","title_sort":"temperature-dependent decomposition of SiO studied by infrared vibrational spectroscopy"}],"person":[{"family":"Wetzel","given":"Steffen","roleDisplay":"VerfasserIn","display":"Wetzel, Steffen","role":"aut"},{"given":"Markus","family":"Klevenz","role":"aut","roleDisplay":"VerfasserIn","display":"Klevenz, Markus"},{"role":"aut","roleDisplay":"VerfasserIn","display":"Pucci, Annemarie","given":"Annemarie","family":"Pucci"},{"display":"Gail, Hans-Peter","roleDisplay":"VerfasserIn","role":"aut","family":"Gail","given":"Hans-Peter"}],"relHost":[{"id":{"zdb":["1474251-2"],"eki":["269243860"],"issn":["1943-3530"]},"origin":[{"publisherPlace":"London ; Frederick, Md. ; Washington, D.C.","dateIssuedKey":"1952","publisher":"Sage ; Society for Applied Spectroscopy ; OSA Publishing","dateIssuedDisp":"1952-"}],"name":{"displayForm":["published in association with Society for Applied Spectroscopy"]},"physDesc":[{"extent":"Online-Ressource"}],"title":[{"subtitle":"an international journal of spectroscopy","title":"Applied spectroscopy","title_sort":"Applied spectroscopy"}],"part":{"extent":"6","text":"62(2012), 9, Seite 1061-1066","volume":"62","issue":"9","pages":"1061-1066","year":"2012"},"titleAlt":[{"title":"AS"}],"pubHistory":["6.1952 -"],"corporate":[{"role":"isb","display":"Society for Applied Spectroscopy","roleDisplay":"Herausgebendes Organ"}],"language":["eng"],"recId":"269243860","disp":"The temperature-dependent decomposition of SiO studied by infrared vibrational spectroscopyApplied spectroscopy","note":["Gesehen am 15.05.25"],"type":{"bibl":"periodical","media":"Online-Ressource"}}],"physDesc":[{"extent":"6 S."}],"id":{"doi":["10.1366/12-06658"],"eki":["1572244232"]},"origin":[{"dateIssuedKey":"2012","dateIssuedDisp":"September 1, 2012"}],"name":{"displayForm":["Steffen Wetzel, Markus Klevenz, Annemarie Pucci, Hans-Peter Gail"]}} | ||
| SRT | |a WETZELSTEFTEMPERATUR1201 | ||