Modification of pyridine-terminated aromatic self-assembled monolayers by electron irradiation

Using a series of model systems, we studied the effect of electron irradiation on pyridine-terminated aromatic thiolate self-assembled monolayers (SAMs) on Au(111). All these SAMs exhibited behavior similar to that of oligophenyl-based films, viz. a progressive and extensive cross-linking, preventin...

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Main Authors: Yildirim, Can (Author) , Sauter, Eric (Author) , Zharnikov, Michael (Author)
Format: Article (Journal)
Language:English
Published: April 24, 2017
In: The journal of physical chemistry. C, Energy, materials, and catalysis
Year: 2017, Volume: 121, Issue: 18, Pages: 9982-9990
ISSN:1932-7455
DOI:10.1021/acs.jpcc.7b02153
Online Access:Verlag, Volltext: http://dx.doi.org/10.1021/acs.jpcc.7b02153
Verlag, Volltext: https://doi.org/10.1021/acs.jpcc.7b02153
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Author Notes:Can Yildirim, Eric Sauter, Andreas Terfort, and Michael Zharnikov

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520 |a Using a series of model systems, we studied the effect of electron irradiation on pyridine-terminated aromatic thiolate self-assembled monolayers (SAMs) on Au(111). All these SAMs exhibited behavior similar to that of oligophenyl-based films, viz. a progressive and extensive cross-linking, preventing release of individual molecules and their fragments and slowing down and hindering the damage of the SAM/substrate interface. The pyridine moieties participated in the formation of the cross-linking network, which was accompanied by their chemical modification and partial hydrogenation. As a consequence, the nitrogen content in the films did not change significantly upon irradiation (only ∼10% for the densely packed SAMs) and the modified pyridine moieties became reactive toward carboxylic acid anhydrides. The extent of irradiation-induced modification and damage was found to depend strongly on the structural quality and packing density of the monolayers. The results of the experiments suggest several potential applications of pyridine-terminated aromatic SAMs in context of their modification by electron irradiation, in the framework of conventional and chemical lithography as well as advanced nanofabrication. 
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