Characterization of aluminum oxide tunnel barriers by combining transport measurements and transmission electron microscopy imaging
We present two approaches for studying the uniformity of a tunnel barrier. The first approach is based on measuring single-electron and two-electron tunneling in a hybrid single-electron transistor. Our measurements indicate that the effective area of a conduction channel is about one order of magni...
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| Main Authors: | , , , , , , , , , |
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| Format: | Article (Journal) |
| Language: | English |
| Published: |
19 August 2014
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| In: |
Journal of applied physics
Year: 2014, Volume: 116, Issue: 7 |
| ISSN: | 1089-7550 |
| DOI: | 10.1063/1.4893473 |
| Online Access: | Verlag, lizenzpflichtig, Volltext: https://doi.org/10.1063/1.4893473 Verlag, lizenzpflichtig, Volltext: https://aip.scitation.org/doi/10.1063/1.4893473 
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| Author Notes: | T. Aref, A. Averin, S. van Dijken, A. Ferring, M. Koberidze, V.F. Maisi, H.Q. Nguyend, R.M. Nieminen, J.P. Pekola, and L.D. Yao |
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| 520 | |a We present two approaches for studying the uniformity of a tunnel barrier. The first approach is based on measuring single-electron and two-electron tunneling in a hybrid single-electron transistor. Our measurements indicate that the effective area of a conduction channel is about one order of magnitude larger than predicted by theoretical calculations. With the second method, transmission electron microscopy, we demonstrate that variations in the barrier thickness are a plausible explanation for the larger effective area and an enhancement of higher order tunneling processes. | ||
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| 700 | 1 | |a Maisi, V. F. |e VerfasserIn |4 aut | |
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