Electron-beam irradiation of cinnamate films affords nanoscale patterned substrates for use in devices and as scaffolds in tissue engineering
The fabrication of electronic, photonic, and metamaterial-based devices, or tissue engineering requires the controlled deposition and patterning of materials. Electron-beam lithography (EBL) offers unprecedented miniaturization of those devices because of its high resolution. We present a concept to...
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| Hauptverfasser: | , , , , , , , , , , , |
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| Dokumenttyp: | Article (Journal) |
| Sprache: | Englisch |
| Veröffentlicht: |
June 5, 2020
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| In: |
ACS applied nano materials
Year: 2020, Jahrgang: 3, Heft: 8, Pages: 7365-7370 |
| ISSN: | 2574-0970 |
| DOI: | 10.1021/acsanm.0c00458 |
| Online-Zugang: | Verlag, lizenzpflichtig, Volltext: https://doi.org/10.1021/acsanm.0c00458
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| Verfasserangaben: | Karl-Philipp Strunk, N. Maximilian Bojanowski, Christian Huck, Markus Bender, Lisa Veith, Michael Tzschoppe, Jan Freudenberg, Irene Wacker, Rasmus R. Schröder, Annemarie Pucci, Christian Melzer, and Uwe H.F. Bunz |
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| 520 | |a The fabrication of electronic, photonic, and metamaterial-based devices, or tissue engineering requires the controlled deposition and patterning of materials. Electron-beam lithography (EBL) offers unprecedented miniaturization of those devices because of its high resolution. We present a concept to induce a classic photochemical reaction in condensed matter via EBL. We investigate the response of a tetrameric cinnamate monomer in thin films toward photon and electron radiation. In the solid state, photoexcitation and electron bombardment similarly induce [2 + 2] cycloadditions, forming insoluble truxilic acid esters, as shown via IR spectroscopy measurements. Subsequently, we employed the investigated material as an electron-beam resist, showing resistance against wet-chemical etchants. Structures with resolution down to 60 nm were obtained, not achievable with conventional photolithography, proving that [2 + 2] cycloaddition of cinnamic acid containing compounds is suitable for applications in the field of EBL. | ||
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