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Black and white fused silica: modified sol-gel process combined with moth-eye structuring for highly absorbing and diffuse reflecting SiO2 glass

Diffuse reflecting (white) and highly absorbing (black) fused silica based materials are presented, which combine volume modified substrates and surfaces equipped with anti-reflective moth-eye-structures. For diffuse reflection, micrometer sized cavities are created in bulk fused silica during a sol...

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Bibliographic Details
Main Authors: Brunner, Robert (Author) , Kraus, Matthias (Author) , Hirte, Johannes (Author) , Diao, Zhaolu (Author) , Weishaupt, Klaus (Author) , Spatz, Joachim P. (Author) , Harzendorf, Torsten (Author) , Trost, Marcus (Author) , Munser, Anne-Sophie (Author) , Schröder, Sven (Author) , Baer, Michael (Author)
Format: Article (Journal)
Language:English
Published: 13 October 2020
In: Optics express
Year: 2020, Volume: 28, Issue: 22, Pages: 32499-32516
ISSN:1094-4087
DOI:10.1364/OE.406150
Online Access:Verlag, lizenzpflichtig, Volltext: https://doi.org/10.1364/OE.406150
Verlag, lizenzpflichtig, Volltext: https://www.osapublishing.org/oe/abstract.cfm?uri=oe-28-22-32499
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Author Notes:Robert Brunner, Matthias Kraus, Johannes Hirte, Zhaolu Diao, Klaus Weishaupt, Joachim P. Spatz, Torsten Harzendorf, Marcus Trost, Anne-Sophie Munser, Sven Schröder, and Michael Baer
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Summary:Diffuse reflecting (white) and highly absorbing (black) fused silica based materials are presented, which combine volume modified substrates and surfaces equipped with anti-reflective moth-eye-structures. For diffuse reflection, micrometer sized cavities are created in bulk fused silica during a sol-gel process. In contrast, carbon black particles are added to get the highly absorbing material. The moth-eye-structures are prepared by block copolymer micelle nanolithography (BCML), followed by a reactive-ion-etching (RIE) step. The moth-eye-structures drastically reduce the specular reflectance on both diffuse reflecting and highly absorbing samples across a wide spectral range from 250 nm to 2500 nm and for varying incidence angles. The adjustment of the height of the moth-eye-structures allows us to select the spectral position of the specular reflectance minimum, which measures less than 0.1%. Diffuse Lambertian-like scattering and absorbance appear nearly uniform across the selected spectral range, showing a slight decrease with increasing wavelength.
Item Description:Im Titel ist "2" in SiO2 tiefgestellt
Gesehen am 03.02.2021
Physical Description:Online Resource
ISSN:1094-4087
DOI:10.1364/OE.406150

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