Preparation, IR spectroscopy, and time-of-flight mass spectrometry of halogenated and methylated Si(111)
The preparation of chlorine-, bromine-, and iodine-terminated silicon surfaces (Si(111):Cl, Br, and I) using atomically flat Si(111)-(1×1):H is described. The halogenated surfaces were obtained by photochemically induced radical substitution reactions with the corresponding dihalogen in a Schlenk tu...
Gespeichert in:
| Hauptverfasser: | , |
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| Dokumenttyp: | Article (Journal) |
| Sprache: | Englisch |
| Veröffentlicht: |
08 June 2011
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| In: |
Applied physics. A, Materials science & processing
Year: 2011, Jahrgang: 104, Heft: 3, Pages: 987-991 |
| ISSN: | 1432-0630 |
| DOI: | 10.1007/s00339-011-6483-0 |
| Online-Zugang: | Verlag, lizenzpflichtig, Volltext: https://doi.org/10.1007/s00339-011-6483-0
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| Verfasserangaben: | Nils Salingue, Peter Hess |
MARC
| LEADER | 00000caa a2200000 c 4500 | ||
|---|---|---|---|
| 001 | 1817965212 | ||
| 003 | DE-627 | ||
| 005 | 20230710112914.0 | ||
| 007 | cr uuu---uuuuu | ||
| 008 | 221004s2011 xx |||||o 00| ||eng c | ||
| 024 | 7 | |a 10.1007/s00339-011-6483-0 |2 doi | |
| 035 | |a (DE-627)1817965212 | ||
| 035 | |a (DE-599)KXP1817965212 | ||
| 035 | |a (OCoLC)1389781428 | ||
| 040 | |a DE-627 |b ger |c DE-627 |e rda | ||
| 041 | |a eng | ||
| 084 | |a 30 |2 sdnb | ||
| 100 | 1 | |a Salingue, Nils |e VerfasserIn |0 (DE-588)140391762 |0 (DE-627)618265376 |0 (DE-576)316060682 |4 aut | |
| 245 | 1 | 0 | |a Preparation, IR spectroscopy, and time-of-flight mass spectrometry of halogenated and methylated Si(111) |c Nils Salingue, Peter Hess |
| 264 | 1 | |c 08 June 2011 | |
| 300 | |a 5 | ||
| 336 | |a Text |b txt |2 rdacontent | ||
| 337 | |a Computermedien |b c |2 rdamedia | ||
| 338 | |a Online-Ressource |b cr |2 rdacarrier | ||
| 500 | |a Gesehen am 04.10.2022 | ||
| 520 | |a The preparation of chlorine-, bromine-, and iodine-terminated silicon surfaces (Si(111):Cl, Br, and I) using atomically flat Si(111)-(1×1):H is described. The halogenated surfaces were obtained by photochemically induced radical substitution reactions with the corresponding dihalogen in a Schlenk tube by conventional inert gas chemistry. The nucleophilic substitution of the Si-Cl functionality with the Grignard reagent (CH3MgCl) resulted in the unreconstructed methylated Si(111)-(1×1):CH3 surface. The halogenated and methylated silicon surfaces were characterized by Fourier transform infrared (FTIR) spectroscopy and laser-induced desorption of monolayers (LIDOM). Calibration of the desorption temperature via analysis of time-of-flight (TOF) distributions as a function of laser fluence allowed the determination of the originally emitted neutral fragments by TOF mass spectrometry using electron-impact ionization. The halogens were desorbed atomically and as SiXn(X = Cl, Br) clusters. The methyl groups mainly desorbed as methyl and ethyl fragments and a small amount of +SiCH3. | ||
| 650 | 4 | |a Desorption Temperature | |
| 650 | 4 | |a Grignard Reagent | |
| 650 | 4 | |a Organic Monolayer | |
| 650 | 4 | |a SiCl | |
| 650 | 4 | |a Silicon Surface | |
| 700 | 1 | |a Hess, Peter |d 1941- |e VerfasserIn |0 (DE-588)122041135 |0 (DE-627)081699611 |0 (DE-576)302553339 |4 aut | |
| 773 | 0 | 8 | |i Enthalten in |t Applied physics. A, Materials science & processing |d Berlin : Springer, 1973 |g 104(2011), 3, Seite 987-991 |h Online-Ressource |w (DE-627)235503231 |w (DE-600)1398311-8 |w (DE-576)061935999 |x 1432-0630 |7 nnas |a Preparation, IR spectroscopy, and time-of-flight mass spectrometry of halogenated and methylated Si(111) |
| 773 | 1 | 8 | |g volume:104 |g year:2011 |g number:3 |g pages:987-991 |g extent:5 |a Preparation, IR spectroscopy, and time-of-flight mass spectrometry of halogenated and methylated Si(111) |
| 856 | 4 | 0 | |u https://doi.org/10.1007/s00339-011-6483-0 |x Verlag |x Resolving-System |z lizenzpflichtig |3 Volltext |
| 951 | |a AR | ||
| 992 | |a 20221004 | ||
| 993 | |a Article | ||
| 994 | |a 2011 | ||
| 998 | |g 122041135 |a Hess, Peter |m 122041135:Hess, Peter |d 120000 |d 120300 |e 120000PH122041135 |e 120300PH122041135 |k 0/120000/ |k 1/120000/120300/ |p 2 |y j | ||
| 999 | |a KXP-PPN1817965212 |e 4194195019 | ||
| BIB | |a Y | ||
| SER | |a journal | ||
| JSO | |a {"relHost":[{"origin":[{"publisherPlace":"Berlin ; Heidelberg ; New York","dateIssuedDisp":"1973-","dateIssuedKey":"1973","publisher":"Springer"}],"id":{"issn":["1432-0630"],"eki":["235503231"],"zdb":["1398311-8"]},"physDesc":[{"extent":"Online-Ressource"}],"title":[{"partname":"Materials science & processing","title":"Applied physics","title_sort":"Applied physics"}],"disp":"Preparation, IR spectroscopy, and time-of-flight mass spectrometry of halogenated and methylated Si(111)Applied physics. A, Materials science & processing","type":{"media":"Online-Ressource","bibl":"periodical"},"note":["Gesehen am 20.03.25"],"recId":"235503231","language":["eng"],"pubHistory":["Volume 60, issue 1 (January 1995)-"],"titleAlt":[{"title":"Applied physics / A"}],"part":{"year":"2011","issue":"3","pages":"987-991","volume":"104","text":"104(2011), 3, Seite 987-991","extent":"5"}}],"physDesc":[{"extent":"5 S."}],"id":{"eki":["1817965212"],"doi":["10.1007/s00339-011-6483-0"]},"origin":[{"dateIssuedKey":"2011","dateIssuedDisp":"08 June 2011"}],"name":{"displayForm":["Nils Salingue, Peter Hess"]},"recId":"1817965212","language":["eng"],"type":{"bibl":"article-journal","media":"Online-Ressource"},"note":["Gesehen am 04.10.2022"],"title":[{"title":"Preparation, IR spectroscopy, and time-of-flight mass spectrometry of halogenated and methylated Si(111)","title_sort":"Preparation, IR spectroscopy, and time-of-flight mass spectrometry of halogenated and methylated Si(111)"}],"person":[{"family":"Salingue","given":"Nils","display":"Salingue, Nils","roleDisplay":"VerfasserIn","role":"aut"},{"display":"Hess, Peter","roleDisplay":"VerfasserIn","role":"aut","family":"Hess","given":"Peter"}]} | ||
| SRT | |a SALINGUENIPREPARATIO0820 | ||