Electron-irradiation promoted exchange reaction as a tool for surface engineering and chemical lithography
Self-assembled monolayers (SAMs) can serve as versatile resist/template materials for surface engineering and electron beam lithography (EBL), making possible a new type of lateral patterning: chemical lithography (CL). Whereas CL has been well established for aromatic SAMs, it is hardly possible fo...
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| Main Authors: | , |
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| Format: | Article (Journal) |
| Language: | English |
| Published: |
2021
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| In: |
Advanced materials interfaces
Year: 2021, Volume: 8, Issue: 10, Pages: 1-14 |
| ISSN: | 2196-7350 |
| DOI: | 10.1002/admi.202100148 |
| Online Access: | Verlag, kostenfrei, Volltext: https://doi.org/10.1002/admi.202100148 Verlag, kostenfrei, Volltext: https://onlinelibrary.wiley.com/doi/abs/10.1002/admi.202100148 
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| Author Notes: | Andreas Terfort and Michael Zharnikov |
MARC
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| 520 | |a Self-assembled monolayers (SAMs) can serve as versatile resist/template materials for surface engineering and electron beam lithography (EBL), making possible a new type of lateral patterning: chemical lithography (CL). Whereas CL has been well established for aromatic SAMs, it is hardly possible for aliphatic monolayers, because of extensive irradiation-induced damage excluding selective modification of specific chemical groups. Turning this drawback into an advantage, the irradiation-promoted exchange reaction approach is developed, which is described in detail in the present review. The key idea of the approach is tuning the extent of the exchange reaction between a primary aliphatic SAM covering the substrate and a potential molecular substituent, which is capable of building a SAM on the same support, by electron irradiation. The major advantages of the approach are low irradiation doses (≤1 mC cm−2) and flexible choice of SAM-forming molecules, with a broad pool available commercially. Consequently, a large variety of binary SAMs with controlled compositions can be prepared and, in combination with EBL, complex chemical patterns can be fabricated, serving in particular as templates for subsequent area-selective chemical reactions, surface-initiated polymerization, attachment of nanoparticles, non-specific and specific proteins adsorption, and growth of 3D DNA nanostructures. | ||
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| 650 | 4 | |a electron beam lithography | |
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| 650 | 4 | |a polymer brushes | |
| 650 | 4 | |a self-assembled monolayers | |
| 650 | 4 | |a single-strand DNA | |
| 650 | 4 | |a specific protein adsorption | |
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