APA-Zitierstil (7. Ausg.)

Kleditzsch, S., & Riedel, U. (2000). Sensitivity studies of silicon etching in chlorine/argon plasmas. Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 18(5), . https://doi.org/10.1116/1.1285997

Chicago-Zitierstil (17. Ausg.)

Kleditzsch, Stefan, und Uwe Riedel. "Sensitivity Studies of Silicon Etching in Chlorine/argon Plasmas." Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, and Films 18, no. 5 (2000). https://doi.org/10.1116/1.1285997.

MLA-Zitierstil (9. Ausg.)

Kleditzsch, Stefan, und Uwe Riedel. "Sensitivity Studies of Silicon Etching in Chlorine/argon Plasmas." Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, and Films, vol. 18, no. 5, 2000, https://doi.org/10.1116/1.1285997.