Sensitivity studies of silicon etching in chlorine/argon plasmas
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| Main Authors: | , |
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| Format: | Article (Journal) |
| Language: | English |
| Published: |
September 2000
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| In: |
Journal of vacuum science & technology. A, Vacuum, surfaces, and films
Year: 2000, Volume: 18, Issue: 5, Pages: 2130-2136 |
| ISSN: | 1520-8559 |
| DOI: | 10.1116/1.1285997 |
| Online Access: | Verlag, Volltext: http://dx.doi.org/10.1116/1.1285997 Verlag, Volltext: http://avs.scitation.org/doi/abs/10.1116/1.1285997 
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| Author Notes: | S. Kleditzsch and U. Riedel |
| Item Description: | Gesehen am 02.10.2017 |
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| Physical Description: | Online Resource |
| ISSN: | 1520-8559 |
| DOI: | 10.1116/1.1285997 |