Growth and properties of strained VO x thin films with controlled stoichiometry

We have succeeded in growing epitaxial films of rocksalt VOx on MgO(001) substrates. The oxygen content as a function of oxygen flux was determined using 18O2-Rutherford backscattering spectrometry and the vanadium valence using x-ray-absorption spectroscopy. The upper and lower stoichiometry limits...

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Bibliographic Details
Main Authors: Rata, Diana (Author) , Haverkort, Maurits W. (Author)
Format: Article (Journal)
Language:English
Published: 13 February 2004
In: Physical review. B, Condensed matter and materials physics
Year: 2004, Volume: 69, Issue: 7, Pages: 075404
ISSN:1550-235X
DOI:10.1103/PhysRevB.69.075404
Online Access:Verlag, Volltext: http://dx.doi.org/10.1103/PhysRevB.69.075404
Verlag, Volltext: https://link.aps.org/doi/10.1103/PhysRevB.69.075404
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Author Notes:A.D. Rata, A R. Chezan, M.W. Haverkort, H.H. Hsieh, H.-J. Lin, C.T. Chen, L.H. Tjeng, and T. Hibma
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Summary:We have succeeded in growing epitaxial films of rocksalt VOx on MgO(001) substrates. The oxygen content as a function of oxygen flux was determined using 18O2-Rutherford backscattering spectrometry and the vanadium valence using x-ray-absorption spectroscopy. The upper and lower stoichiometry limits found are similar to those known for bulk material (0.8<x<1.3). From the reflection high-energy electron diffraction oscillation period a large number of vacancies for both vanadium and oxygen were deduced, i.e., ≈16% for stoichiometric VO. These numbers are, surprisingly, very similar to those for bulk material and consequently quite strain insensitive. X-ray-absorption spectroscopy measurements reveal that the vacancies give rise to strong non-cubic crystal field effects. The electrical conductivity of the films is much lower than the conductivity of bulk samples, which we attribute to a decrease in the direct overlap between t2g orbitals in the coherently strained layers. The temperature dependence of the conductivity is consistent with a variable range hopping mechanism.
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Physical Description:Online Resource
ISSN:1550-235X
DOI:10.1103/PhysRevB.69.075404