Growth and properties of strained VO x thin films with controlled stoichiometry

We have succeeded in growing epitaxial films of rocksalt VOx on MgO(001) substrates. The oxygen content as a function of oxygen flux was determined using 18O2-Rutherford backscattering spectrometry and the vanadium valence using x-ray-absorption spectroscopy. The upper and lower stoichiometry limits...

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Hauptverfasser: Rata, Diana (VerfasserIn) , Haverkort, Maurits W. (VerfasserIn)
Dokumenttyp: Article (Journal)
Sprache:Englisch
Veröffentlicht: 13 February 2004
In: Physical review. B, Condensed matter and materials physics
Year: 2004, Jahrgang: 69, Heft: 7, Pages: 075404
ISSN:1550-235X
DOI:10.1103/PhysRevB.69.075404
Online-Zugang:Verlag, Volltext: http://dx.doi.org/10.1103/PhysRevB.69.075404
Verlag, Volltext: https://link.aps.org/doi/10.1103/PhysRevB.69.075404
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Verfasserangaben:A.D. Rata, A R. Chezan, M.W. Haverkort, H.H. Hsieh, H.-J. Lin, C.T. Chen, L.H. Tjeng, and T. Hibma

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LEADER 00000caa a2200000 c 4500
001 1565155440
003 DE-627
005 20220814015727.0
007 cr uuu---uuuuu
008 171108s2004 xx |||||o 00| ||eng c
024 7 |a 10.1103/PhysRevB.69.075404  |2 doi 
035 |a (DE-627)1565155440 
035 |a (DE-576)495155446 
035 |a (DE-599)BSZ495155446 
035 |a (OCoLC)1340981625 
040 |a DE-627  |b ger  |c DE-627  |e rda 
041 |a eng 
084 |a 29  |2 sdnb 
100 1 |a Rata, Diana  |d 1973-  |e VerfasserIn  |0 (DE-588)1146583702  |0 (DE-627)1007175508  |0 (DE-576)188407634  |4 aut 
245 1 0 |a Growth and properties of strained VO x thin films with controlled stoichiometry  |c A.D. Rata, A R. Chezan, M.W. Haverkort, H.H. Hsieh, H.-J. Lin, C.T. Chen, L.H. Tjeng, and T. Hibma 
264 1 |c 13 February 2004 
300 |a 11 
336 |a Text  |b txt  |2 rdacontent 
337 |a Computermedien  |b c  |2 rdamedia 
338 |a Online-Ressource  |b cr  |2 rdacarrier 
500 |a Im Titel ist "x" tiefgestellt 
500 |a Gesehen am 08.11.2017 
520 |a We have succeeded in growing epitaxial films of rocksalt VOx on MgO(001) substrates. The oxygen content as a function of oxygen flux was determined using 18O2-Rutherford backscattering spectrometry and the vanadium valence using x-ray-absorption spectroscopy. The upper and lower stoichiometry limits found are similar to those known for bulk material (0.8<x<1.3). From the reflection high-energy electron diffraction oscillation period a large number of vacancies for both vanadium and oxygen were deduced, i.e., ≈16% for stoichiometric VO. These numbers are, surprisingly, very similar to those for bulk material and consequently quite strain insensitive. X-ray-absorption spectroscopy measurements reveal that the vacancies give rise to strong non-cubic crystal field effects. The electrical conductivity of the films is much lower than the conductivity of bulk samples, which we attribute to a decrease in the direct overlap between t2g orbitals in the coherently strained layers. The temperature dependence of the conductivity is consistent with a variable range hopping mechanism. 
700 1 |a Haverkort, Maurits W.  |d 1976-  |e VerfasserIn  |0 (DE-588)130132047  |0 (DE-627)491717946  |0 (DE-576)257824006  |4 aut 
773 0 8 |i Enthalten in  |t Physical review. B, Condensed matter and materials physics  |d College Park, Md. : APS, 1998  |g 69(2004,7) Artikel-Nummer 075404, 11 Seiten  |h Online-Ressource  |w (DE-627)268760349  |w (DE-600)1473011-X  |w (DE-576)077610237  |x 1550-235X  |7 nnas  |a Growth and properties of strained VO x thin films with controlled stoichiometry 
773 1 8 |g volume:69  |g year:2004  |g number:7  |g pages:075404  |g extent:11  |a Growth and properties of strained VO x thin films with controlled stoichiometry 
856 4 0 |u http://dx.doi.org/10.1103/PhysRevB.69.075404  |x Verlag  |x Resolving-System  |3 Volltext 
856 4 0 |u https://link.aps.org/doi/10.1103/PhysRevB.69.075404  |x Verlag  |3 Volltext 
951 |a AR 
992 |a 20171108 
993 |a Article 
994 |a 2004 
998 |g 130132047  |a Haverkort, Maurits W.  |m 130132047:Haverkort, Maurits W.  |p 3 
999 |a KXP-PPN1565155440  |e 2986793894 
BIB |a Y 
SER |a journal 
JSO |a {"relHost":[{"origin":[{"dateIssuedKey":"1998","publisher":"APS","publisherPlace":"College Park, Md.","dateIssuedDisp":"1998-2015"}],"part":{"issue":"7","year":"2004","extent":"11","pages":"075404","text":"69(2004,7) Artikel-Nummer 075404, 11 Seiten","volume":"69"},"titleAlt":[{"title":"Physical review / B"},{"title":"B online"}],"title":[{"title_sort":"Physical review","partname":"Condensed matter and materials physics","title":"Physical review"}],"physDesc":[{"extent":"Online-Ressource"}],"disp":"Growth and properties of strained VO x thin films with controlled stoichiometryPhysical review. B, Condensed matter and materials physics","pubHistory":["3. Series, volume 57, issue 1 (January 1998)-volume 92, issue 24 (December 2015)"],"note":["Gesehen am 03.11.25"],"recId":"268760349","name":{"displayForm":["The American Physical Society"]},"language":["eng"],"id":{"zdb":["1473011-X"],"issn":["1550-235X"],"eki":["268760349"]},"type":{"media":"Online-Ressource","bibl":"periodical"},"corporate":[{"display":"American Physical Society","role":"isb"}]}],"title":[{"title":"Growth and properties of strained VO x thin films with controlled stoichiometry","title_sort":"Growth and properties of strained VO x thin films with controlled stoichiometry"}],"person":[{"role":"aut","given":"Diana","family":"Rata","display":"Rata, Diana"},{"display":"Haverkort, Maurits W.","family":"Haverkort","given":"Maurits W.","role":"aut"}],"physDesc":[{"extent":"11 S."}],"type":{"media":"Online-Ressource","bibl":"article-journal"},"id":{"eki":["1565155440"],"doi":["10.1103/PhysRevB.69.075404"]},"language":["eng"],"origin":[{"dateIssuedDisp":"13 February 2004","dateIssuedKey":"2004"}],"note":["Im Titel ist \"x\" tiefgestellt","Gesehen am 08.11.2017"],"recId":"1565155440","name":{"displayForm":["A.D. Rata, A R. Chezan, M.W. Haverkort, H.H. Hsieh, H.-J. Lin, C.T. Chen, L.H. Tjeng, and T. Hibma"]}} 
SRT |a RATADIANAHGROWTHANDP1320