Hole-Mask Colloidal Nanolithography for Large-Area Low-Cost Metamaterials and Antenna-Assisted Surface-Enhanced Infrared Absorption Substrates
We use low-cost hole-mask colloidal nanolithography to manufacture large-area resonant split-ring metamaterials and measure their infrared optical properties. This novel substrate is employed for antenna-assisted surface-enhanced infrared absorption measurements using octadecanethiol (ODT) and deute...
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| Main Authors: | , |
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| Format: | Article (Journal) |
| Language: | English |
| Published: |
December 16, 2011
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| In: |
ACS nano
Year: 2012, Volume: 6, Issue: 1, Pages: 979-985 |
| ISSN: | 1936-086X |
| DOI: | 10.1021/nn2047982 |
| Online Access: | Verlag, Volltext: http://dx.doi.org/10.1021/nn2047982 Verlag, Volltext: https://doi.org/10.1021/nn2047982 
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| Author Notes: | Stefano Cataldo, Jun Zhao, Frank Neubrech, Bettina Frank, Chunjie Zhang, Paul V. Braun, Harald Giessen |
| Summary: | We use low-cost hole-mask colloidal nanolithography to manufacture large-area resonant split-ring metamaterials and measure their infrared optical properties. This novel substrate is employed for antenna-assisted surface-enhanced infrared absorption measurements using octadecanethiol (ODT) and deuterated ODT, which demonstrates easy adjustability of our material to vibrational modes. Our method has the potential to make resonant plasmon-enhanced infrared spectroscopy a standard lab tool in biology, pharmacology, and medicine. |
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| Item Description: | Gesehen am 03.05.2018 |
| Physical Description: | Online Resource |
| ISSN: | 1936-086X |
| DOI: | 10.1021/nn2047982 |