Hole-Mask Colloidal Nanolithography for Large-Area Low-Cost Metamaterials and Antenna-Assisted Surface-Enhanced Infrared Absorption Substrates
We use low-cost hole-mask colloidal nanolithography to manufacture large-area resonant split-ring metamaterials and measure their infrared optical properties. This novel substrate is employed for antenna-assisted surface-enhanced infrared absorption measurements using octadecanethiol (ODT) and deute...
Gespeichert in:
| Hauptverfasser: | , |
|---|---|
| Dokumenttyp: | Article (Journal) |
| Sprache: | Englisch |
| Veröffentlicht: |
December 16, 2011
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| In: |
ACS nano
Year: 2012, Jahrgang: 6, Heft: 1, Pages: 979-985 |
| ISSN: | 1936-086X |
| DOI: | 10.1021/nn2047982 |
| Online-Zugang: | Verlag, Volltext: http://dx.doi.org/10.1021/nn2047982 Verlag, Volltext: https://doi.org/10.1021/nn2047982 |
| Verfasserangaben: | Stefano Cataldo, Jun Zhao, Frank Neubrech, Bettina Frank, Chunjie Zhang, Paul V. Braun, Harald Giessen |
MARC
| LEADER | 00000caa a2200000 c 4500 | ||
|---|---|---|---|
| 001 | 1572583770 | ||
| 003 | DE-627 | ||
| 005 | 20230426124312.0 | ||
| 007 | cr uuu---uuuuu | ||
| 008 | 180503s2011 xx |||||o 00| ||eng c | ||
| 024 | 7 | |a 10.1021/nn2047982 |2 doi | |
| 035 | |a (DE-627)1572583770 | ||
| 035 | |a (DE-576)502583770 | ||
| 035 | |a (DE-599)BSZ502583770 | ||
| 035 | |a (OCoLC)1341008226 | ||
| 040 | |a DE-627 |b ger |c DE-627 |e rda | ||
| 041 | |a eng | ||
| 084 | |a 29 |2 sdnb | ||
| 100 | 1 | |a Cataldo, Stefano |e VerfasserIn |4 aut | |
| 245 | 1 | 0 | |a Hole-Mask Colloidal Nanolithography for Large-Area Low-Cost Metamaterials and Antenna-Assisted Surface-Enhanced Infrared Absorption Substrates |c Stefano Cataldo, Jun Zhao, Frank Neubrech, Bettina Frank, Chunjie Zhang, Paul V. Braun, Harald Giessen |
| 264 | 1 | |c December 16, 2011 | |
| 300 | |a 7 | ||
| 336 | |a Text |b txt |2 rdacontent | ||
| 337 | |a Computermedien |b c |2 rdamedia | ||
| 338 | |a Online-Ressource |b cr |2 rdacarrier | ||
| 500 | |a Gesehen am 03.05.2018 | ||
| 520 | |a We use low-cost hole-mask colloidal nanolithography to manufacture large-area resonant split-ring metamaterials and measure their infrared optical properties. This novel substrate is employed for antenna-assisted surface-enhanced infrared absorption measurements using octadecanethiol (ODT) and deuterated ODT, which demonstrates easy adjustability of our material to vibrational modes. Our method has the potential to make resonant plasmon-enhanced infrared spectroscopy a standard lab tool in biology, pharmacology, and medicine. | ||
| 700 | 1 | |a Neubrech, Frank |e VerfasserIn |0 (DE-588)136731694 |0 (DE-627)585869065 |0 (DE-576)301245118 |4 aut | |
| 773 | 0 | 8 | |i Enthalten in |a American Chemical Society |t ACS nano |d Washington, DC : Soc., 2007 |g 6(2012), 1, Seite 979-985 |h Online-Ressource |w (DE-627)539881392 |w (DE-600)2383064-5 |w (DE-576)276561139 |x 1936-086X |7 nnas |
| 773 | 1 | 8 | |g volume:6 |g year:2012 |g number:1 |g pages:979-985 |g extent:7 |a Hole-Mask Colloidal Nanolithography for Large-Area Low-Cost Metamaterials and Antenna-Assisted Surface-Enhanced Infrared Absorption Substrates |
| 856 | 4 | 0 | |u http://dx.doi.org/10.1021/nn2047982 |x Verlag |x Resolving-System |3 Volltext |
| 856 | 4 | 0 | |u https://doi.org/10.1021/nn2047982 |x Verlag |3 Volltext |
| 951 | |a AR | ||
| 992 | |a 20180503 | ||
| 993 | |a Article | ||
| 994 | |a 2012 | ||
| 998 | |g 136731694 |a Neubrech, Frank |m 136731694:Neubrech, Frank |d 130000 |d 130700 |e 130000PN136731694 |e 130700PN136731694 |k 0/130000/ |k 1/130000/130700/ |p 3 | ||
| 999 | |a KXP-PPN1572583770 |e 3007831660 | ||
| BIB | |a Y | ||
| SER | |a journal | ||
| JSO | |a {"type":{"bibl":"article-journal","media":"Online-Ressource"},"note":["Gesehen am 03.05.2018"],"recId":"1572583770","language":["eng"],"person":[{"given":"Stefano","family":"Cataldo","role":"aut","roleDisplay":"VerfasserIn","display":"Cataldo, Stefano"},{"role":"aut","roleDisplay":"VerfasserIn","display":"Neubrech, Frank","given":"Frank","family":"Neubrech"}],"title":[{"title":"Hole-Mask Colloidal Nanolithography for Large-Area Low-Cost Metamaterials and Antenna-Assisted Surface-Enhanced Infrared Absorption Substrates","title_sort":"Hole-Mask Colloidal Nanolithography for Large-Area Low-Cost Metamaterials and Antenna-Assisted Surface-Enhanced Infrared Absorption Substrates"}],"physDesc":[{"extent":"7 S."}],"relHost":[{"physDesc":[{"extent":"Online-Ressource"}],"origin":[{"publisherPlace":"Washington, DC","dateIssuedDisp":"2007-","dateIssuedKey":"2007","publisher":"Soc."}],"id":{"issn":["1936-086X"],"eki":["539881392"],"zdb":["2383064-5"]},"name":{"displayForm":["American Chemical Society"]},"pubHistory":["1.2007,Aug. -"],"part":{"pages":"979-985","issue":"1","year":"2012","extent":"7","text":"6(2012), 1, Seite 979-985","volume":"6"},"titleAlt":[{"title":"Nano"}],"type":{"media":"Online-Ressource","bibl":"periodical"},"disp":"American Chemical SocietyACS nano","corporate":[{"roleDisplay":"VerfasserIn","display":"American Chemical Society","role":"aut"}],"language":["eng"],"recId":"539881392","title":[{"title":"ACS nano","title_sort":"ACS nano"}]}],"name":{"displayForm":["Stefano Cataldo, Jun Zhao, Frank Neubrech, Bettina Frank, Chunjie Zhang, Paul V. Braun, Harald Giessen"]},"origin":[{"dateIssuedDisp":"December 16, 2011","dateIssuedKey":"2011"}],"id":{"doi":["10.1021/nn2047982"],"eki":["1572583770"]}} | ||
| SRT | |a CATALDOSTEHOLEMASKCO1620 | ||