Modification of pyridine-terminated aromatic self-assembled monolayers by electron irradiation
Using a series of model systems, we studied the effect of electron irradiation on pyridine-terminated aromatic thiolate self-assembled monolayers (SAMs) on Au(111). All these SAMs exhibited behavior similar to that of oligophenyl-based films, viz. a progressive and extensive cross-linking, preventin...
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| Main Authors: | , , |
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| Format: | Article (Journal) |
| Language: | English |
| Published: |
April 24, 2017
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| In: |
The journal of physical chemistry. C, Energy, materials, and catalysis
Year: 2017, Volume: 121, Issue: 18, Pages: 9982-9990 |
| ISSN: | 1932-7455 |
| DOI: | 10.1021/acs.jpcc.7b02153 |
| Online Access: | Verlag, Volltext: http://dx.doi.org/10.1021/acs.jpcc.7b02153 Verlag, Volltext: https://doi.org/10.1021/acs.jpcc.7b02153 
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| Author Notes: | Can Yildirim, Eric Sauter, Andreas Terfort, and Michael Zharnikov |
| Summary: | Using a series of model systems, we studied the effect of electron irradiation on pyridine-terminated aromatic thiolate self-assembled monolayers (SAMs) on Au(111). All these SAMs exhibited behavior similar to that of oligophenyl-based films, viz. a progressive and extensive cross-linking, preventing release of individual molecules and their fragments and slowing down and hindering the damage of the SAM/substrate interface. The pyridine moieties participated in the formation of the cross-linking network, which was accompanied by their chemical modification and partial hydrogenation. As a consequence, the nitrogen content in the films did not change significantly upon irradiation (only ∼10% for the densely packed SAMs) and the modified pyridine moieties became reactive toward carboxylic acid anhydrides. The extent of irradiation-induced modification and damage was found to depend strongly on the structural quality and packing density of the monolayers. The results of the experiments suggest several potential applications of pyridine-terminated aromatic SAMs in context of their modification by electron irradiation, in the framework of conventional and chemical lithography as well as advanced nanofabrication. |
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| Item Description: | Gesehen am 03.07.2018 |
| Physical Description: | Online Resource |
| ISSN: | 1932-7455 |
| DOI: | 10.1021/acs.jpcc.7b02153 |