Mathijssen, S. G. J., Cölle, M., Mank, A. J. G., Kemerink, M., Bobbert, P. A., & Leeuw, D. M. d. (2007). Scanning Kelvin probe microscopy on organic field-effect transistors during gate bias stress. Applied physics letters, 90(19), . https://doi.org/10.1063/1.2737419
Chicago Style (17th ed.) CitationMathijssen, Simon G. J., Michael Cölle, A. J. G. Mank, Martijn Kemerink, Peter A. Bobbert, and Dago M. de Leeuw. "Scanning Kelvin Probe Microscopy on Organic Field-effect Transistors During Gate Bias Stress." Applied Physics Letters 90, no. 19 (2007). https://doi.org/10.1063/1.2737419.
MLA (9th ed.) CitationMathijssen, Simon G. J., et al. "Scanning Kelvin Probe Microscopy on Organic Field-effect Transistors During Gate Bias Stress." Applied Physics Letters, vol. 90, no. 19, 2007, https://doi.org/10.1063/1.2737419.