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Electron-beam irradiation of cinnamate films affords nanoscale patterned substrates for use in devices and as scaffolds in tissue engineering

The fabrication of electronic, photonic, and metamaterial-based devices, or tissue engineering requires the controlled deposition and patterning of materials. Electron-beam lithography (EBL) offers unprecedented miniaturization of those devices because of its high resolution. We present a concept to...

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Main Authors: Strunk, Karl-Philipp (Author) , Bojanowski, Maximilian (Author) , Huck, Christian (Author) , Bender, Markus (Author) , Veith, Lisa (Author) , Tzschoppe, Michael (Author) , Freudenberg, Jan (Author) , Wacker, Irene (Author) , Schröder, Rasmus R. (Author) , Pucci, Annemarie (Author) , Melzer, Christian (Author) , Bunz, Uwe H. F. (Author)
Format: Article (Journal)
Language:English
Published: June 5, 2020
In: ACS applied nano materials
Year: 2020, Volume: 3, Issue: 8, Pages: 7365-7370
ISSN:2574-0970
DOI:10.1021/acsanm.0c00458
Online Access:Verlag, lizenzpflichtig, Volltext: https://doi.org/10.1021/acsanm.0c00458
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Author Notes:Karl-Philipp Strunk, N. Maximilian Bojanowski, Christian Huck, Markus Bender, Lisa Veith, Michael Tzschoppe, Jan Freudenberg, Irene Wacker, Rasmus R. Schröder, Annemarie Pucci, Christian Melzer, and Uwe H.F. Bunz
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Summary:The fabrication of electronic, photonic, and metamaterial-based devices, or tissue engineering requires the controlled deposition and patterning of materials. Electron-beam lithography (EBL) offers unprecedented miniaturization of those devices because of its high resolution. We present a concept to induce a classic photochemical reaction in condensed matter via EBL. We investigate the response of a tetrameric cinnamate monomer in thin films toward photon and electron radiation. In the solid state, photoexcitation and electron bombardment similarly induce [2 + 2] cycloadditions, forming insoluble truxilic acid esters, as shown via IR spectroscopy measurements. Subsequently, we employed the investigated material as an electron-beam resist, showing resistance against wet-chemical etchants. Structures with resolution down to 60 nm were obtained, not achievable with conventional photolithography, proving that [2 + 2] cycloaddition of cinnamic acid containing compounds is suitable for applications in the field of EBL.
Item Description:Gesehen am 08.10.2020
Physical Description:Online Resource
ISSN:2574-0970
DOI:10.1021/acsanm.0c00458

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