Buchumschlag

Electron-beam irradiation of cinnamate films affords nanoscale patterned substrates for use in devices and as scaffolds in tissue engineering

The fabrication of electronic, photonic, and metamaterial-based devices, or tissue engineering requires the controlled deposition and patterning of materials. Electron-beam lithography (EBL) offers unprecedented miniaturization of those devices because of its high resolution. We present a concept to...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Strunk, Karl-Philipp (VerfasserIn) , Bojanowski, Maximilian (VerfasserIn) , Huck, Christian (VerfasserIn) , Bender, Markus (VerfasserIn) , Veith, Lisa (VerfasserIn) , Tzschoppe, Michael (VerfasserIn) , Freudenberg, Jan (VerfasserIn) , Wacker, Irene (VerfasserIn) , Schröder, Rasmus R. (VerfasserIn) , Pucci, Annemarie (VerfasserIn) , Melzer, Christian (VerfasserIn) , Bunz, Uwe H. F. (VerfasserIn)
Dokumenttyp: Article (Journal)
Sprache:Englisch
Veröffentlicht: June 5, 2020
In: ACS applied nano materials
Year: 2020, Jahrgang: 3, Heft: 8, Pages: 7365-7370
ISSN:2574-0970
DOI:10.1021/acsanm.0c00458
Online-Zugang:Verlag, lizenzpflichtig, Volltext: https://doi.org/10.1021/acsanm.0c00458
Volltext
Verfasserangaben:Karl-Philipp Strunk, N. Maximilian Bojanowski, Christian Huck, Markus Bender, Lisa Veith, Michael Tzschoppe, Jan Freudenberg, Irene Wacker, Rasmus R. Schröder, Annemarie Pucci, Christian Melzer, and Uwe H.F. Bunz
Beschreibung
Zusammenfassung:The fabrication of electronic, photonic, and metamaterial-based devices, or tissue engineering requires the controlled deposition and patterning of materials. Electron-beam lithography (EBL) offers unprecedented miniaturization of those devices because of its high resolution. We present a concept to induce a classic photochemical reaction in condensed matter via EBL. We investigate the response of a tetrameric cinnamate monomer in thin films toward photon and electron radiation. In the solid state, photoexcitation and electron bombardment similarly induce [2 + 2] cycloadditions, forming insoluble truxilic acid esters, as shown via IR spectroscopy measurements. Subsequently, we employed the investigated material as an electron-beam resist, showing resistance against wet-chemical etchants. Structures with resolution down to 60 nm were obtained, not achievable with conventional photolithography, proving that [2 + 2] cycloaddition of cinnamic acid containing compounds is suitable for applications in the field of EBL.
Beschreibung:Gesehen am 08.10.2020
Beschreibung:Online Resource
ISSN:2574-0970
DOI:10.1021/acsanm.0c00458

Ähnliche Einträge