Mapping charge-carrier density across the p-n junction in ambipolar carbon-nanotube networks by Raman microscopy

In situ confocal Raman microscopy is used to map the recombination zone (induced p-n junction) in an ambipolar carbon-nanotube-network transistor with high spatial resolution. The shift of the 2D mode (G’ mode) depending on hole and electron accumulation serves as a measure for the local charge-carr...

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Hauptverfasser: Grimm, Stefan (VerfasserIn) , Zaumseil, Jana (VerfasserIn)
Dokumenttyp: Article (Journal)
Sprache:Englisch
Veröffentlicht: 22 October 2014
In: Advanced materials
Year: 2014, Jahrgang: 26, Heft: 47, Pages: 7986-7992
ISSN:1521-4095
DOI:10.1002/adma.201403655
Online-Zugang:Verlag, lizenzpflichtig, Volltext: https://doi.org/10.1002/adma.201403655
Verlag, lizenzpflichtig, Volltext: https://onlinelibrary.wiley.com/doi/abs/10.1002/adma.201403655
Volltext
Verfasserangaben:Stefan B. Grimm, Florian Jakubka, Stefan P. Schießl, Florentina Gannott, and Jana Zaumseil
Beschreibung
Zusammenfassung:In situ confocal Raman microscopy is used to map the recombination zone (induced p-n junction) in an ambipolar carbon-nanotube-network transistor with high spatial resolution. The shift of the 2D mode (G’ mode) depending on hole and electron accumulation serves as a measure for the local charge-carrier density and provides complementary information about charge transport and recombination in ambipolar transistors.
Beschreibung:Gesehen am 20.10.2020
Beschreibung:Online Resource
ISSN:1521-4095
DOI:10.1002/adma.201403655