Buchumschlag

Evaporation and condensation of SiO and SiO2 studied by infrared spectroscopy

Physical evaporation of SiO and SiO2 under ultra-high vacuum conditions was monitored in situ with infrared spectroscopy at frequencies between 450 cm−1 and 5000 cm−1. The measured vibrational spectra of the condensed films are identical in both cases, for SiO and SiO2 evaporation, and can be descri...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Klevenz, Markus (VerfasserIn) , Wetzel, Steffen (VerfasserIn) , Möller, Michael (VerfasserIn) , Pucci, Annemarie (VerfasserIn)
Dokumenttyp: Article (Journal)
Sprache:Englisch
Veröffentlicht: March 1, 2010
In: Applied spectroscopy
Year: 2010, Jahrgang: 64, Heft: 3, Pages: 298-303
ISSN:1943-3530
DOI:10.1366/000370210790918346
Online-Zugang:Verlag, lizenzpflichtig, Volltext: https://doi.org/10.1366/000370210790918346
Volltext
Verfasserangaben:M. Klevenz, S. Wetzel, M. Möller, and A. Pucci
Beschreibung
Zusammenfassung:Physical evaporation of SiO and SiO2 under ultra-high vacuum conditions was monitored in situ with infrared spectroscopy at frequencies between 450 cm−1 and 5000 cm−1. The measured vibrational spectra of the condensed films are identical in both cases, for SiO and SiO2 evaporation, and can be described with four Brendel oscillators located at 380 cm−1, 713 cm−1, 982 cm−1, and 1101 cm−1, corresponding to typical vibration modes in SiO.
Beschreibung:Im Titel ist "2" bei SiO2 tiefgestellt
Gesehen am 23.03.2021
Beschreibung:Online Resource
ISSN:1943-3530
DOI:10.1366/000370210790918346

Ähnliche Einträge