Modification of alkanethiolate self-assembled monolayers by ultraviolet light: the effect of wavelength

The effect of the wavelength upon the modification of the archetypical nonsubstituted alkanethiolate (AT) self-assembled monolayers (SAMs) on Au(111) by ultraviolet (UV) light was investigated. As a test system, the dodecanethiolate monolayer was selected, while the wavelength of the UV light was va...

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Bibliographic Details
Main Authors: Yan, Rui (Author) , Terfort, Andreas (Author) , Zharnikov, Michael (Author)
Format: Article (Journal)
Language:English
Published: January 13, 2021
In: The journal of physical chemistry. C, Energy, materials, and catalysis
Year: 2021, Volume: 125, Issue: 3, Pages: 1855-1864
ISSN:1932-7455
DOI:10.1021/acs.jpcc.0c09438
Online Access:Verlag, lizenzpflichtig, Volltext: https://doi.org/10.1021/acs.jpcc.0c09438
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Author Notes:Rui Yan, Andreas Terfort, and Michael Zharnikov
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Summary:The effect of the wavelength upon the modification of the archetypical nonsubstituted alkanethiolate (AT) self-assembled monolayers (SAMs) on Au(111) by ultraviolet (UV) light was investigated. As a test system, the dodecanethiolate monolayer was selected, while the wavelength of the UV light was varied in two steps from 254 to 375 nm, which is a relevant range for a variety of inexpensive UV sources as well as custom-made and commercial lithography setups. The absolute cross sections of the most prominent and application-relevant UV-induced processes, above all photooxidation of the thiolate anchoring groups to sulfonates, were determined. They were found to decrease exponentially with increasing wavelength, with an effective “wavelength attenuation parameter” of ∼24 nm. This behavior was rationalized within a model assuming the primary role of UV-induced hot electrons, originating from the substrate and triggering an excitation and subsequent oxidation of the sulfur atoms by their reaction with oxygen molecules, penetrating to the SAM-substrate interface across the SAM matrix. The observed behavior and the absolute values of the photooxidation cross sections represent a useful “tool” for the estimation of a proper dose or dose range in the applications involving modification of AT SAMs and thiolate SAMs in general by UV light.
Item Description:Gesehen am 10.09.2021
Physical Description:Online Resource
ISSN:1932-7455
DOI:10.1021/acs.jpcc.0c09438