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Printing and erasing of DNA-based photoresists inside synthetic cells [research data]

In the pursuit to produce functioning synthetic cells from the bottom up, DNA nanotechnology has proven to be a powerful tool. However, the crowded yet highly organized arrangement in living cells, bridging from the nano- to the micron-scale, remains challenging to recreate with DNA-based architectu...

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Bibliographic Details
Main Authors: Göpfrich, Kerstin (Author) , Walther, Tobias (Author)
Format: Database Research Data
Language:English
Published: Heidelberg Universität 2022-02-28
DOI:10.11588/data/MKOC9S
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Forschungsdaten
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Online Access:Verlag, kostenfrei, Volltext: https://doi.org/10.11588/data/MKOC9S
Verlag, kostenfrei, Volltext: https://heidata.uni-heidelberg.de/dataset.xhtml?persistentId=doi:10.11588/data/MKOC9S
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Author Notes:Kerstin Goepfrich, Tobias Walther
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Summary:In the pursuit to produce functioning synthetic cells from the bottom up, DNA nanotechnology has proven to be a powerful tool. However, the crowded yet highly organized arrangement in living cells, bridging from the nano- to the micron-scale, remains challenging to recreate with DNA-based architectures. Here, laser microprinting is established to print and erase shape-controlled DNA hydrogels inside the confinement of water-in-oil droplets and giant unilamellar lipid vesicles (GUVs). The DNA-based photoresist consists of a photocleavable inactive DNA linker which interconnects Y-shaped DNA motifs when activated by local irradiation with a 405 nm laser. An alternative linker design allows to erase custom features from a preformed DNA hydrogel with feature sizes down to 1.38um. The present work demonstrates that the DNA hydrogels can serve as an internal support to stabilize non-spherical GUV shapes. Overall, DNA-based photoresists for laser printing in confinement allow to build up architectures on the interior of synthetic cells with light, which diversifies the toolbox of bottom-up synthetic biology.
Item Description:Gesehen am 28.02.2022
Physical Description:Online Resource
DOI:10.11588/data/MKOC9S

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