7 Tesla and beyond: advanced methods and clinical applications in magnetic resonance imaging
Ultrahigh magnetic fields offer significantly higher signal-to-noise ratio, and several magnetic resonance applications additionally benefit from a higher contrast-to-noise ratio, with static magnetic field strengths of B0 ≥ 7 T currently being referred to as ultrahigh fields (UHFs). The advantages...
Saved in:
| Main Authors: | , , |
|---|---|
| Format: | Article (Journal) |
| Language: | English |
| Published: |
Sep 13, 2021
|
| In: |
Investigative radiology
Year: 2021, Volume: 56, Issue: 11, Pages: 705-725 |
| ISSN: | 1536-0210 |
| DOI: | 10.1097/RLI.0000000000000820 |
| Online Access: | Verlag, lizenzpflichtig, Volltext: https://doi.org/10.1097/RLI.0000000000000820 Verlag, lizenzpflichtig, Volltext: https://journals.lww.com/investigativeradiology/Fulltext/2021/11000/7_Tesla_and_Beyond__Advanced_Methods_and_Clinical.4.aspx 
|
| Author Notes: | Tanja Platt, PhD, Mark E. Ladd, PhD, and Daniel Paech, MD, MSc |
| Summary: | Ultrahigh magnetic fields offer significantly higher signal-to-noise ratio, and several magnetic resonance applications additionally benefit from a higher contrast-to-noise ratio, with static magnetic field strengths of B0 ≥ 7 T currently being referred to as ultrahigh fields (UHFs). The advantages of UHF can be used to resolve structures more precisely or to visualize physiological/pathophysiological effects that would be difficult or even impossible to detect at lower field strengths. However, with these advantages also come challenges, such as inhomogeneities applying standard radiofrequency excitation techniques, higher energy deposition in the human body, and enhanced B0 field inhomogeneities. The advantages but also the challenges of UHF as well as promising advanced methodological developments and clinical applications that particularly benefit from UHF are discussed in this review article. |
|---|---|
| Item Description: | Gesehen am 30.03.2021 |
| Physical Description: | Online Resource |
| ISSN: | 1536-0210 |
| DOI: | 10.1097/RLI.0000000000000820 |