Onset of pattern formation in thin ferromagnetic films with perpendicular anisotropy

We consider the onset of pattern formation in an ultrathin ferromagnetic film of the form Ωt:=Ω×[0,t] for Ω⋐R2 with preferred perpendicular magnetization direction. The relative micromagnetic energy is given by E[M]=∫Ωtd2|∇M|2+Q∫Ωt(M21+M22)+∫R3|H(M)|2−∫R3|H(e3χΩt)|2, describing the energy difference...

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Bibliographic Details
Main Authors: Brietzke, Birger (Author) , Knüpfer, Hans (Author)
Format: Article (Journal) Chapter/Article
Language:English
Published: 20 May 2022
In: Arxiv
Year: 2022, Pages: 1-27
DOI:10.48550/arXiv.2205.10061
Online Access:Verlag, lizenzpflichtig, Volltext: https://doi.org/10.48550/arXiv.2205.10061
Verlag, lizenzpflichtig, Volltext: http://arxiv.org/abs/2205.10061
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Author Notes:Birger Brietzke and Hans Knüpfer
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Summary:We consider the onset of pattern formation in an ultrathin ferromagnetic film of the form Ωt:=Ω×[0,t] for Ω⋐R2 with preferred perpendicular magnetization direction. The relative micromagnetic energy is given by E[M]=∫Ωtd2|∇M|2+Q∫Ωt(M21+M22)+∫R3|H(M)|2−∫R3|H(e3χΩt)|2, describing the energy difference for a given magnetization M:R3→R3 with |M|=χΩt and the uniform magnetization e3χΩt. For t≪d, we derive the scaling of the minimal energy and a BV-bound in the critical regime, where the base area of the film has size of order |Ω|12∼(Q−1)−12de2πdtQ−1√. We furthermore investigate the onset of non-trivial pattern formation in the critical regime depending on the size of the rescaled film.
Item Description:Gesehen am 14.10.2022
Physical Description:Online Resource
DOI:10.48550/arXiv.2205.10061