Low-temperature solution-processed high-capacitance AlOx dielectrics for low-voltage carbon-based transistors

Low-temperature processing of high-capacitance metal oxide-based dielectrics by solution-based methods and their application in developing low-voltage carbon-based transistors may enable next-generation low-cost, power-efficient, flexible and transparent electronics. In this work, a high-capacitance...

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Main Authors: Kumar, Ashwini (Author) , Perinot, Andrea (Author) , Sarkar, Sudipta Kumar (Author) , Gupta, Dipti (Author) , Zorn, Nicolas (Author) , Zaumseil, Jana (Author) , Caironi, Mario (Author)
Format: Article (Journal)
Language:English
Published: 2 September 2022
In: Organic electronics
Year: 2022, Volume: 110, Pages: 1-9
DOI:10.1016/j.orgel.2022.106636
Online Access:Resolving-System, lizenzpflichtig, Volltext: https://doi.org/10.1016/j.orgel.2022.106636
Verlag, lizenzpflichtig, Volltext: https://www.sciencedirect.com/science/article/pii/S1566119922002087
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Author Notes:Ashwini Kumar, Andrea Perinot, Sudipta Kumar Sarkar, Dipti Gupta, Nicolas F. Zorn, Jana Zaumseil, Mario Caironi
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Summary:Low-temperature processing of high-capacitance metal oxide-based dielectrics by solution-based methods and their application in developing low-voltage carbon-based transistors may enable next-generation low-cost, power-efficient, flexible and transparent electronics. In this work, a high-capacitance AlOx film was developed at a relatively low annealing temperature of ⁓200 °C from its spin-coated precursor solution.
Item Description:Im Titel erscheint in der chemischen Formel das x tiefgestellt
Gesehen am 29.11.2022
Physical Description:Online Resource
DOI:10.1016/j.orgel.2022.106636