Low-temperature solution-processed high-capacitance AlOx dielectrics for low-voltage carbon-based transistors

Low-temperature processing of high-capacitance metal oxide-based dielectrics by solution-based methods and their application in developing low-voltage carbon-based transistors may enable next-generation low-cost, power-efficient, flexible and transparent electronics. In this work, a high-capacitance...

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Hauptverfasser: Kumar, Ashwini (VerfasserIn) , Perinot, Andrea (VerfasserIn) , Sarkar, Sudipta Kumar (VerfasserIn) , Gupta, Dipti (VerfasserIn) , Zorn, Nicolas (VerfasserIn) , Zaumseil, Jana (VerfasserIn) , Caironi, Mario (VerfasserIn)
Dokumenttyp: Article (Journal)
Sprache:Englisch
Veröffentlicht: 2 September 2022
In: Organic electronics
Year: 2022, Jahrgang: 110, Pages: 1-9
DOI:10.1016/j.orgel.2022.106636
Online-Zugang:Resolving-System, lizenzpflichtig, Volltext: https://doi.org/10.1016/j.orgel.2022.106636
Verlag, lizenzpflichtig, Volltext: https://www.sciencedirect.com/science/article/pii/S1566119922002087
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Verfasserangaben:Ashwini Kumar, Andrea Perinot, Sudipta Kumar Sarkar, Dipti Gupta, Nicolas F. Zorn, Jana Zaumseil, Mario Caironi
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Zusammenfassung:Low-temperature processing of high-capacitance metal oxide-based dielectrics by solution-based methods and their application in developing low-voltage carbon-based transistors may enable next-generation low-cost, power-efficient, flexible and transparent electronics. In this work, a high-capacitance AlOx film was developed at a relatively low annealing temperature of ⁓200 °C from its spin-coated precursor solution.
Beschreibung:Im Titel erscheint in der chemischen Formel das x tiefgestellt
Gesehen am 29.11.2022
Beschreibung:Online Resource
DOI:10.1016/j.orgel.2022.106636