Tailored antireflective biomimetic nanostructures for UV applications

Antireflective surfaces composed of biomimetic sub-wavelength structures that employ the ‘moth eye principle’ for reflectance reduction are highly desirable in many optical applications such as solar cells, photodetectors and laser optics. We report an efficient approach for the fabrication of antir...

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Bibliographic Details
Main Authors: Morhard, Christoph (Author) , Pacholski, Claudia (Author) , Lehr, Dennis (Author) , Brunner, Robert (Author) , Helgert, Michael (Author) , Sundermann, Michael (Author) , Spatz, Joachim P. (Author)
Format: Article (Journal)
Language:English
Published: 22 September 2010
In: Nanotechnology
Year: 2010, Volume: 21, Issue: 42, Pages: 1-6
ISSN:1361-6528
DOI:10.1088/0957-4484/21/42/425301
Online Access:Verlag, lizenzpflichtig, Volltext: https://doi.org/10.1088/0957-4484/21/42/425301
Verlag, lizenzpflichtig, Volltext: https://dx.doi.org/10.1088/0957-4484/21/42/425301
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Author Notes:Christoph Morhard, Claudia Pacholski, Dennis Lehr, Robert Brunner, Michael Helgert, Michael Sundermann and Joachim P Spatz
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Summary:Antireflective surfaces composed of biomimetic sub-wavelength structures that employ the ‘moth eye principle’ for reflectance reduction are highly desirable in many optical applications such as solar cells, photodetectors and laser optics. We report an efficient approach for the fabrication of antireflective surfaces based on a two-step process consisting of gold nanoparticle mask generation by micellar block copolymer nanolithography and a multi-step reactive ion etching process. Depending on the RIE process parameters nanostructured surfaces with tailored antireflective properties can easily be fabricated that show optimum performance for specific applications.
Item Description:Gesehen am 04.05.2023
Physical Description:Online Resource
ISSN:1361-6528
DOI:10.1088/0957-4484/21/42/425301