Simulation of homoepitaxial growth on the diamond (100) surface using detailed reaction mechanisms

One-dimensional reactive-flow simulations of a hot-filament CVD-system including detailed surface reaction mechanisms for homoepitaxial diamond growth are carried out. A growth model for the diamond (100) surface based on elementary chemical reactions steps is introduced. This surface reaction schem...

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Bibliographic Details
Main Authors: Ruf, Bernhard (Author) , Behrendt, Frank (Author) , Deutschmann, Olaf (Author) , Warnatz, Jürgen (Author)
Format: Article (Journal)
Language:English
Published: 1996
In: Surface science
Year: 1996, Volume: 352-354, Pages: 602-606
ISSN:1879-2758
DOI:10.1016/0039-6028(95)01210-9
Online Access:Verlag, lizenzpflichtig, Volltext: https://doi.org/10.1016/0039-6028(95)01210-9
Verlag, lizenzpflichtig, Volltext: https://www.sciencedirect.com/science/article/pii/0039602895012109
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Author Notes:Bernhard Ruf, Frank Behrendt, Olaf Deutschmann, Jürgen Warnatz
Description
Summary:One-dimensional reactive-flow simulations of a hot-filament CVD-system including detailed surface reaction mechanisms for homoepitaxial diamond growth are carried out. A growth model for the diamond (100) surface based on elementary chemical reactions steps is introduced. This surface reaction scheme includes the incorporation of the CH3 radical in the diamond lattice. Homoepitaxial growth on the (100) surface is modelled for a wide range of experimental reactor parameters. The experimental growth rates are compared with simulations for two different surface reaction schemes. It is found that the scheme based on growth at monoatomic steps on the reconstructed (100) surface is more realistic. It shows qualitative agreement with experimental data, whereas the more simple mechanism for an unrealistic unreconstructed (100) surface cannot explain the surface temperature dependence of the growth rate correctly.
Item Description:Elektronische Reproduktion der Druck-Ausgabe 6. April 2000
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Physical Description:Online Resource
ISSN:1879-2758
DOI:10.1016/0039-6028(95)01210-9