Production of negative osmium ions by laser desorption and ionization

The interest to produce negative osmium ions is manifold in the realm of high-accuracy ion trap experiments: high-resolution nearly Doppler-free laser spectroscopy, antihydrogen formation in its ground state, and contributions to neutrino mass spectrometry. Production of these ions is generally acco...

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Hauptverfasser: Rodríguez, Daniel (VerfasserIn) , Sonnenschein, V. (VerfasserIn) , Blaum, Klaus (VerfasserIn) , Block, M. (VerfasserIn) , Kluge, H.-J. (VerfasserIn) , Lallena, A. M. (VerfasserIn) , Raeder, S. (VerfasserIn) , Wendt, K. (VerfasserIn)
Dokumenttyp: Article (Journal)
Sprache:Englisch
Veröffentlicht: 6 January 2010
In: Review of scientific instruments
Year: 2010, Jahrgang: 81, Heft: 1, Pages: 1-4
ISSN:1089-7623
DOI:10.1063/1.3276685
Online-Zugang:Verlag, lizenzpflichtig, Volltext: https://doi.org/10.1063/1.3276685
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Verfasserangaben:D. Rodríguez, V. Sonnenschein, K. Blaum, M. Block, H.-J. Kluge, A.M. Lallena, S. Raeder, and K. Wendt
Beschreibung
Zusammenfassung:The interest to produce negative osmium ions is manifold in the realm of high-accuracy ion trap experiments: high-resolution nearly Doppler-free laser spectroscopy, antihydrogen formation in its ground state, and contributions to neutrino mass spectrometry. Production of these ions is generally accomplished by sputtering an Os sample with Cs+ ions at tens of keV. Though this is a well-established method commonly used at accelerators, these kind of sources are quite demanding and tricky to operate. Therefore, the development of a more straightforward and cost effective production scheme will be of benefit for ion trap and other experiments. Such a scheme makes use of desorption and ionization with pulsed lasers and identification of the ions by time-of-flight mass spectrometry. First investigations of negative osmium ion production using a pulsed laser for desorption and ionization and a commercial matrix-assisted laser desorption/ionization time-of-flight system for identification has demonstrated the suitability of this technique. More than 103 negative osmium ions per shot were registered after bombarding pure osmium powder with a 5 ns pulse width Nd:yttrium aluminum garnet laser. The limitation in the ion number was imposed by the detection limit of the microchannel plate detector.
Beschreibung:Gesehen am 25.05.2023
Beschreibung:Online Resource
ISSN:1089-7623
DOI:10.1063/1.3276685