Laser scanner for direct writing lithography
A laser scanner and a stepping xy stage have been developed for direct writing lithography in the micron and the submicron range. System design is described and examples of exposed photoresist with a structure size of 1 μm are presented.
Guardado en:
| Autores principales: | , , , |
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| Formato: | Article (Journal) |
| Lenguaje: | inglés |
| Publicado: |
1989
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| In: |
Applied optics
Year: 1989, Volumen: 28, Número: 17, Pages: 3754-3758 |
| DOI: | 10.1364/AO.28.003754 |
| Acceso en línea: | Verlag, lizenzpflichtig, Volltext: https://doi.org/10.1364/AO.28.003754 Verlag, lizenzpflichtig, Volltext: https://opg.optica.org/ao/abstract.cfm?uri=ao-28-17-3754 
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| Notas de Autor: | Clemens Rensch, Stefan Hell, Manfred v. Schickfus, and Siegfried Hunklinger |
| Sumario: | A laser scanner and a stepping xy stage have been developed for direct writing lithography in the micron and the submicron range. System design is described and examples of exposed photoresist with a structure size of 1 μm are presented. |
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| Notas: | Gesehen am 02.07.2026 |
| Descripción Física: | Online Resource |
| DOI: | 10.1364/AO.28.003754 |