Three dimensional nanolithography with light forces

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Bibliographic Details
Other Authors: Müther, Tobias (Other) , Oberthaler, Markus K. (Other)
Format: Article (Journal)
Language:English
Published: 2001
In: Microelectronic engineering
Year: 2001, Volume: 57-58, Pages: 857-863
DOI:/10.1016/S0167-9317(01)00442-7
Online Access:Resolving-System, Volltext: http://dx.doi.org//10.1016/S0167-9317(01)00442-7
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Author Notes:T. Müther, Th. Schulze, D. Jürgens, M. K. Oberthaler, and J. Mlynek
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Physical Description:Online Resource
DOI:/10.1016/S0167-9317(01)00442-7