Three dimensional nanolithography with light forces

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Bibliographische Detailangaben
Weitere Verfasser: Müther, Tobias (BerichterstatterIn) , Oberthaler, Markus K. (BerichterstatterIn)
Dokumenttyp: Article (Journal)
Sprache:Englisch
Veröffentlicht: 2001
In: Microelectronic engineering
Year: 2001, Jahrgang: 57-58, Pages: 857-863
DOI:/10.1016/S0167-9317(01)00442-7
Online-Zugang:Resolving-System, Volltext: http://dx.doi.org//10.1016/S0167-9317(01)00442-7
Volltext
Verfasserangaben:T. Müther, Th. Schulze, D. Jürgens, M. K. Oberthaler, and J. Mlynek

MARC

LEADER 00000caa a2200000 c 4500
001 1429198281
003 DE-627
005 20220810114158.0
007 cr uuu---uuuuu
008 120220s2001 xx |||||o 00| ||eng c
024 7 |a 10.1016/S0167-9317(01)00442-7  |2 doi 
035 |a (DE-627)1429198281 
035 |a (DE-576)359198287 
035 |a (DE-599)BSZ359198287 
035 |a (OCoLC)1340407159 
040 |a DE-627  |b ger  |c DE-627  |e rakwb 
041 |a eng 
084 |a 29  |2 sdnb 
245 0 0 |a Three dimensional nanolithography with light forces  |c T. Müther, Th. Schulze, D. Jürgens, M. K. Oberthaler, and J. Mlynek 
264 1 |c 2001 
300 |a 7 
336 |a Text  |b txt  |2 rdacontent 
337 |a Computermedien  |b c  |2 rdamedia 
338 |a Online-Ressource  |b cr  |2 rdacarrier 
700 1 |a Müther, Tobias  |d 1973-  |0 (DE-588)130564192  |0 (DE-627)503826049  |0 (DE-576)298270463  |4 oth 
700 1 |a Oberthaler, Markus K.  |d 1968-  |0 (DE-588)1019626895  |0 (DE-627)690974175  |0 (DE-576)358472768  |4 oth 
773 0 8 |i In  |t Microelectronic engineering  |d [Erscheinungsort nicht ermittelbar] : Elsevier, 1983  |g 57-58(2001), Seite 857-863  |h Online-Ressource  |w (DE-627)30635828X  |w (DE-600)1497065-X  |w (DE-576)081860986  |7 nnas  |a Three dimensional nanolithography with light forces 
773 1 8 |g volume:57-58  |g year:2001  |g pages:857-863  |g extent:7  |a Three dimensional nanolithography with light forces 
856 4 0 |u http://dx.doi.org//10.1016/S0167-9317(01)00442-7  |x Resolving-System  |3 Volltext 
951 |a AR 
992 |a 20120220 
993 |a Article 
994 |a 2001 
998 |g 1019626895  |a Oberthaler, Markus K.  |m 1019626895:Oberthaler, Markus K.  |p 4 
999 |a KXP-PPN1429198281  |e 2704580316 
BIB |a Y 
SER |a journal 
JSO |a {"type":{"bibl":"article-journal","media":"Online-Ressource"},"physDesc":[{"extent":"7 S."}],"recId":"1429198281","relHost":[{"part":{"extent":"7","volume":"57-58","text":"57-58(2001), Seite 857-863","pages":"857-863","year":"2001"},"pubHistory":["1.1983 - 88.2011; Vol. 89.2012 -"],"language":["eng"],"recId":"30635828X","physDesc":[{"extent":"Online-Ressource"}],"disp":"Three dimensional nanolithography with light forcesMicroelectronic engineering","type":{"bibl":"periodical","media":"Online-Ressource"},"id":{"zdb":["1497065-X"],"eki":["30635828X"]},"origin":[{"dateIssuedKey":"1983","publisher":"Elsevier","dateIssuedDisp":"1983-","publisherPlace":"[Erscheinungsort nicht ermittelbar]"}],"title":[{"title_sort":"Microelectronic engineering","title":"Microelectronic engineering"}]}],"language":["eng"],"name":{"displayForm":["T. Müther, Th. Schulze, D. Jürgens, M. K. Oberthaler, and J. Mlynek"]},"person":[{"family":"Müther","given":"Tobias","display":"Müther, Tobias","role":"oth"},{"display":"Oberthaler, Markus K.","role":"oth","family":"Oberthaler","given":"Markus K."}],"title":[{"title":"Three dimensional nanolithography with light forces","title_sort":"Three dimensional nanolithography with light forces"}],"origin":[{"dateIssuedKey":"2001","dateIssuedDisp":"2001"}],"id":{"eki":["1429198281"],"doi":["10.1016/S0167-9317(01)00442-7"]}} 
SRT |a THREEDIMEN2001