Three dimensional nanolithography with light forces
Gespeichert in:
| Weitere Verfasser: | , |
|---|---|
| Dokumenttyp: | Article (Journal) |
| Sprache: | Englisch |
| Veröffentlicht: |
2001
|
| In: |
Microelectronic engineering
Year: 2001, Jahrgang: 57-58, Pages: 857-863 |
| DOI: | /10.1016/S0167-9317(01)00442-7 |
| Online-Zugang: | Resolving-System, Volltext: http://dx.doi.org//10.1016/S0167-9317(01)00442-7 |
| Verfasserangaben: | T. Müther, Th. Schulze, D. Jürgens, M. K. Oberthaler, and J. Mlynek |
MARC
| LEADER | 00000caa a2200000 c 4500 | ||
|---|---|---|---|
| 001 | 1429198281 | ||
| 003 | DE-627 | ||
| 005 | 20220810114158.0 | ||
| 007 | cr uuu---uuuuu | ||
| 008 | 120220s2001 xx |||||o 00| ||eng c | ||
| 024 | 7 | |a 10.1016/S0167-9317(01)00442-7 |2 doi | |
| 035 | |a (DE-627)1429198281 | ||
| 035 | |a (DE-576)359198287 | ||
| 035 | |a (DE-599)BSZ359198287 | ||
| 035 | |a (OCoLC)1340407159 | ||
| 040 | |a DE-627 |b ger |c DE-627 |e rakwb | ||
| 041 | |a eng | ||
| 084 | |a 29 |2 sdnb | ||
| 245 | 0 | 0 | |a Three dimensional nanolithography with light forces |c T. Müther, Th. Schulze, D. Jürgens, M. K. Oberthaler, and J. Mlynek |
| 264 | 1 | |c 2001 | |
| 300 | |a 7 | ||
| 336 | |a Text |b txt |2 rdacontent | ||
| 337 | |a Computermedien |b c |2 rdamedia | ||
| 338 | |a Online-Ressource |b cr |2 rdacarrier | ||
| 700 | 1 | |a Müther, Tobias |d 1973- |0 (DE-588)130564192 |0 (DE-627)503826049 |0 (DE-576)298270463 |4 oth | |
| 700 | 1 | |a Oberthaler, Markus K. |d 1968- |0 (DE-588)1019626895 |0 (DE-627)690974175 |0 (DE-576)358472768 |4 oth | |
| 773 | 0 | 8 | |i In |t Microelectronic engineering |d [Erscheinungsort nicht ermittelbar] : Elsevier, 1983 |g 57-58(2001), Seite 857-863 |h Online-Ressource |w (DE-627)30635828X |w (DE-600)1497065-X |w (DE-576)081860986 |7 nnas |a Three dimensional nanolithography with light forces |
| 773 | 1 | 8 | |g volume:57-58 |g year:2001 |g pages:857-863 |g extent:7 |a Three dimensional nanolithography with light forces |
| 856 | 4 | 0 | |u http://dx.doi.org//10.1016/S0167-9317(01)00442-7 |x Resolving-System |3 Volltext |
| 951 | |a AR | ||
| 992 | |a 20120220 | ||
| 993 | |a Article | ||
| 994 | |a 2001 | ||
| 998 | |g 1019626895 |a Oberthaler, Markus K. |m 1019626895:Oberthaler, Markus K. |p 4 | ||
| 999 | |a KXP-PPN1429198281 |e 2704580316 | ||
| BIB | |a Y | ||
| SER | |a journal | ||
| JSO | |a {"type":{"bibl":"article-journal","media":"Online-Ressource"},"physDesc":[{"extent":"7 S."}],"recId":"1429198281","relHost":[{"part":{"extent":"7","volume":"57-58","text":"57-58(2001), Seite 857-863","pages":"857-863","year":"2001"},"pubHistory":["1.1983 - 88.2011; Vol. 89.2012 -"],"language":["eng"],"recId":"30635828X","physDesc":[{"extent":"Online-Ressource"}],"disp":"Three dimensional nanolithography with light forcesMicroelectronic engineering","type":{"bibl":"periodical","media":"Online-Ressource"},"id":{"zdb":["1497065-X"],"eki":["30635828X"]},"origin":[{"dateIssuedKey":"1983","publisher":"Elsevier","dateIssuedDisp":"1983-","publisherPlace":"[Erscheinungsort nicht ermittelbar]"}],"title":[{"title_sort":"Microelectronic engineering","title":"Microelectronic engineering"}]}],"language":["eng"],"name":{"displayForm":["T. Müther, Th. Schulze, D. Jürgens, M. K. Oberthaler, and J. Mlynek"]},"person":[{"family":"Müther","given":"Tobias","display":"Müther, Tobias","role":"oth"},{"display":"Oberthaler, Markus K.","role":"oth","family":"Oberthaler","given":"Markus K."}],"title":[{"title":"Three dimensional nanolithography with light forces","title_sort":"Three dimensional nanolithography with light forces"}],"origin":[{"dateIssuedKey":"2001","dateIssuedDisp":"2001"}],"id":{"eki":["1429198281"],"doi":["10.1016/S0167-9317(01)00442-7"]}} | ||
| SRT | |a THREEDIMEN2001 | ||