Spatially-averaged model for plasma etch processes: Comparison of different approaches to electron kinetics
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| Main Authors: | , , |
|---|---|
| Format: | Article (Journal) |
| Language: | English |
| Published: |
[1998]
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| In: |
Journal of vacuum science & technology. A, Vacuum, surfaces, and films
Year: 1998, Volume: 16, Issue: 3, Pages: 1560-1565 |
| ISSN: | 1520-8559 |
| DOI: | 10.1116/1.581187 |
| Online Access: | Verlag, Volltext: http://dx.doi.org/10.1116/1.581187 Verlag, Volltext: http://avs.scitation.org/doi/10.1116/1.581187 
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| Author Notes: | P. Ahlrichs, U. Riedel, and J. Warnatz |
MARC
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