Sensitivity studies of silicon etching in chlorine/argon plasmas
Gespeichert in:
| Hauptverfasser: | , |
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| Dokumenttyp: | Article (Journal) |
| Sprache: | Englisch |
| Veröffentlicht: |
September 2000
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| In: |
Journal of vacuum science & technology. A, Vacuum, surfaces, and films
Year: 2000, Jahrgang: 18, Heft: 5, Pages: 2130-2136 |
| ISSN: | 1520-8559 |
| DOI: | 10.1116/1.1285997 |
| Online-Zugang: | Verlag, Volltext: http://dx.doi.org/10.1116/1.1285997 Verlag, Volltext: http://avs.scitation.org/doi/abs/10.1116/1.1285997 
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| Verfasserangaben: | S. Kleditzsch and U. Riedel |
MARC
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